7.9 Pplus¶
RULE NO. |
DESCRIPTION |
LAYOUT RULE |
Layer |
PP = Nplus Implant |
|
PP.1 |
Width |
0.4 |
PP.2 |
Space |
0.4 |
PP.3a |
Space to NCOMP for NCOMP (1) inside LVPWELL (2) outside NWELL and DNWELL |
0.16 |
PP.3b |
Space to NCOMP: For Inside DNWELL. I) NCOMP space to LVPWELL >= 0.43μm II) NCOMP space to LVPWELL< 0.43μm |
0.08 0.16 |
PP.3c |
Space to NCOMP: For Outside DNWELL, inside Nwell: I) NWELL Overlap of NCOMP >= 0.43μm II) NWELL Overlap of NCOMP < 0.43μm |
0.08 0.16 |
PP.3d |
Min/max space to a butted NCOMP |
0 |
PP.3e |
Space to NCOMP edge adjacent to a butting edge |
0 |
PP.4a |
Space related to N-channel gate at a butting edge parallel to gate |
0.32 |
PP.4b |
Within 0.32μm of channel, space to N-channel gate extension perpendicular to the direction of Poly2 |
0.22 |
PP.5a |
Overlap of P-channel gate |
0.23 |
PP.5b |
Extension beyond COMP for COMP (1) Inside NWELL (2) outside LVPWELL but inside DNWELL. |
0.16 |
PP.5c |
Extension beyond COMP: For Inside DNWELL, inside LVPWELL: I) For LVPWELL overlap of Pplus >= 0.43μm for LVPWELL tap II) For LVPWELL overlap of Pplus < 0.43um for the LVPWELL tap |
0.02 0.16 |
PP.5d |
Extension beyond COMP: For Outside DNWELL I) For Pplus to NWELL space >= 0.43μm for Pfield or LVPWELL tap II) For Pplus to NWELL space < 0.43μm for Pfield or LVPWELL tap |
0.02 0.16 |
PP.6 |
Overlap with PCOMP butted to NCOMP |
0.22 |
PP.7 |
Space to unrelated unsalicided Poly2 |
0.18 |
PP.8a |
Minimum Pplus area |
0.35 μm2 |
PP.8b |
Minimum area enclosed by Pplus |
0.35 μm2 |
PP.9 |
Overlap of unsalicided Poly2 |
0.18 |
PP.10 |
Overlap of unsalicided COMP |
0.18 |
PP.11 |
Butting Pplus and NCOMP is forbidden within 0.43μm of Nwell edge (for outside DNWELL) and of LVPWELL edge (for inside DNWELL case). |
|
PP.12 |
Overlap with N-channel Poly2 gate extension is forbidden within 0.32μm of N-channel gate |